Veeco Instruments Inc. based in Plainview, New York USA, reported that the company shipped several of its TurboDisc® EPIK® 868 Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) systems to multiple Chinese LED makers. The LED producers plan to utilize the MOCVD systems to produce LEDs for solid state lighting applications.
Veeco says that the EPIK 868 MOCVD system enables cost per wafer savings of more than 20% compared to previous generations of GaN MOCVD systems. The company also asserts that the EPIK 868 offers the combined advantages of best-in-class wafer uniformity, best operating uptime, and low maintenance costs. In addition, the system features a compact architecture that the company says gives it the greatest yield from the least amount of space.
Based on Veeco’s TurboDisc technology, Veeco says that the four reactor platform gives customers a 35 percent footprint reduction and the highest productivity compared to the competition. Furthermore, the wafer carrier capacity can be increased for greater throughput per batch.
William J. Miller, Ph.D., president of Veeco, commented, “With the EPIK 868, our Chinese customers can continue to take advantage of Veeco’s leading-edge technology development and world-class service offerings at a significantly lower cost of ownership.”
“The EPIK 868 is built upon a production-proven TurboDisc platform with over one-thousand chambers installed worldwide providing the highest operating stability and efficiency for our customers,” added Peo Hansson, Ph.D., senior vice president and general manager, Veeco MOCVD Operations. “Not only will the new EPIK 868 system improve our customers’ productivity and cost of ownership, but it will also provide a highly reliable, leading edge production tool from the MOCVD technology world leader.”